300nm Pitch High Resolution 2D Calibration Standard for AFM

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Description

300nm Pitch High Resolution 2D Calibration Standard for AFMDESCRIPTION 300nm 2D AFM Reference Standard, Certified, Non traceable, Mounted on Disk Period: 300nm pitch nominal, two dimensional array accurate to 1nm. Calibration certificate will give the actual pitch of the standard. Surface Structure: Aluminum bumps on Silicon, 4x3mm die: Bump height (about 50nm) and width (about 150nm) not calibrated. Usability: The calibrated pattern covers the entire chip. There is sufficient usable area to make thousands of

pattern covers the entire die

High Precision 4 110mm NM-SS Au plated 0

300: Pitch 85µm

145nm Very High Resolution AFM Reference Standard on 12mm steel disk

Unmounted n-type staircase SSRM sample

Structure: Si wafer with grating in top surface Pattern type: Array of sharp tips Tip angle: About 50 degrees Tip Radius: ≤10nm Tip Height: 0

tapping and other modes with image sizes from 500nm to 20nm

Total thickness: ±6 um

When performing STM imaging

is for indenting/scratching applications

while the copolymer regions have elastic modulus numbers around 0

or added complexity